Thermal Processing

POCl3 Diffusion, LPCVD Depositions and More

We provide a flexible solution to meet all of your thermal processing needs and quick turnaround goals.

Our 125mm processing capabilities include Thermal Oxidations, Drives, Anneals, POCl3 diffusions, and Solid Source Boron Nitride processing. We also can provide Low Pressure Chemical Vapor Deposition (LPCVD) processing for Low Temperature Oxide, Polysilicon, and Silicon Nitride depositions. We use BDF41 BTI furnaces with cantilevers to provide the best films possible. We have forty-two atmospheric tubes and six LPCVD tubes each with multiple configurations that allow us to provide manufacturing flexibility and unique films to meet your requirements.

Our 200mm processing capabilities include Thermal Oxidations, Drives, Anneals, and POCl3 diffusions as well but does not include Boron Nitride processing at this time. Similarly, we also can provide Low Pressure Chemical Vapor Deposition (LPCVD) processing for Low Temperature Oxide, Polysilicon, and Silicon Nitride depositions with our 200mm equipment set. All 200mm processing is done with our cassette to cassette loaded TEL Alpha 8 vertical furnace systems. We currently have eight atmospheric and two LPCVD tubes to meet your processing requirements and quick turnaround goals.

Comments are closed.